[1]
Ma L, Chen Y, Gong Q, Cheng Z, Ran C F, Liu K, Shi C M 2023 Free Rad. Biol. Medic. 204 184Google Scholar
[2]
Wang X L, Liu J, Li Q X, Li L, Li S R, Ding Y H, Zhao T, Sun Y, Zhang Y T 2023 High Volt. 8 841Google Scholar
[3]
Xi D K, Zhang X H, Yang S Z, Yap S S, Ishikawa K, Hori M, Yap S L 2022 Chin. Phys. B 31 128201Google Scholar
[4]
Kong X H, Xue S, Li H Y, Yang W M, Martynovich E F, Ning W J, Wang R X 2022 Plasma Sources Sci. Technol. 31 095010Google Scholar
[5]
Cui X L, Xu Z B, Zhou Y Y, Zhu X, Wang S, Fang Z 2022 Surf. Coat. Technol. 451 129066Google Scholar
[6]
孔得霖, 杨冰彦, 何锋, 韩若愚, 缪劲松, 宋廷鲁, 欧阳吉庭 2021 物理学报 70 095205Google Scholar
Kong D L, Yang B Y, He F, Han R Y, Miao J S, Song T L, Ouyang J T 2021 Acta Phys. Sin. 70 095205Google Scholar
[7]
Wang R Y, Shen J Y, Ma Y P X, Qin X R, Qin X, Yang F, Ostrikov K, Zhang Q, He J, Zhong X X 2024 Plasma Process. Polym. 21 2300174Google Scholar
[8]
Liu K, Ren W, Ran C F, Zhou R S, Tang W B, Zhou R W, Yang Z H, Ostrikov K 2021 J. Phys. D: Appl. Phys. 54 065201Google Scholar
[9]
Liu Z J, Wang S T, Pang B L, Gao Y T, Li Q S, Xu D H, Liu D X, Zhou R W 2022 Plasma Sources Sci. Technol. 31 05LT03Google Scholar
[10]
Guo L, Xu R B, Guo L, Liu Z C, Zhao Y M, Liu D X, Zhang L, Chen H L, Kong M G 2018 Appl. Environ. Microbiol. 84 e00726-18Google Scholar
[11]
Ran C F, Zhou X F, Wang Z Y, Liu K 2024 Plasma Sources Sci. Technol. 33 015009Google Scholar
[12]
Liu K, Geng W Q, Zhou X F, Duan Q S, Zheng Z F, Ostrikov K 2023 Plasma Sources Sci. Technol. 32 025005Google Scholar
[13]
Liu K, Zuo J, Ran C F, Yang M H, Geng W Q, Liu S T, Ostrikov K 2022 Phys. Chem. Chem. Phys. 24 8940Google Scholar
[14]
Xu H M, Gao J G, Jia P Y, Ran J X, Chen J Y, Li J M 2024 Chin. Phys. B 33 015205Google Scholar
[15]
陈忠琪, 钟安, 戴栋, 宁文军 2022 物理学报 71 165201Google Scholar
Chen Z Q, Zhong A, Dai D, Ning W J 2022 Acta Phys. Sin. 71 165201Google Scholar
[16]
Huang B D, Zhang C, Zhu W C, Lu X P, Shao T 2021 High Volt. 6 665Google Scholar
[17]
Wang B H, Chen L, Liu G M, Song P, Cheng F C, Sun D L. Zeng W, Xu L 2023 Phys. Scr. 98 045612Google Scholar
[18]
Chen M, Dong X P, Wu K Y, Ran J X, Jia P Y, Wu J C, Li X C 2024 Appl. Phys. Lett. 124 214102Google Scholar
[19]
Wu K Y, Liu J N, Wu J C, Chen M, Ran J X, Pang X X, Jia P Y, Li X C, Ren C H 2023 High Volt. 8 1161Google Scholar
[20]
张雪雪, 贾鹏英, 冉俊霞, 李金懋, 孙换霞, 李雪辰 2024 物理学报 73 085201Google Scholar
Zheng X X, Jia P Y, Ran J X, Li J M, Sun H X, Li X C 2024 Acta Phys. Sin. 73 085201Google Scholar
[21]
田富超, 陈雷, 裴欢, 白洁琪, 曾文 2023 光谱学与光谱分析 43 3682Google Scholar
Tian F C, Chen L, Pei H, Bai J Q, Zeng W 2023 Spectros. Spect. Anal. 43 3682Google Scholar
[22]
Jurov A, Skoro N, Spasic K, Modic M, Hojnik N, Vojosevic D, Durovic M, Petrovic Z L, Cvelbar U 2022 Eur. Phys. J. D 76 29Google Scholar
[23]
Bousba H E, Sahli S, Namous W S E, Benterrouche L 2022 IEEE Trans. Plasma Sci. 50 1218Google Scholar
[24]
Zhou X F, Yang M H, Xiang H F, Geng W Q, Liu K 2023 Phys. Chem. Chem. Phys. 25 27427Google Scholar
[25]
刘坤, 杨明昊, 周雄峰, 白杨, 冉从福 2023 高等学校化学学报 44 20230327Google Scholar
Liu K, Yang M H, Zhou X F, Bai Y, Ran C F 2023 Chem. J. Chin. Universities 44 20230327Google Scholar
[26]
Jiang W M, Tang J, Wang Y S, Zhao W, Duan Y X 2014 Appl. Phys. Lett. 104 013505Google Scholar
[27]
Liu C T, Kumakura T, Ishikawa K, Hashizume H, Takeda K, Ito M, Hori M, Wu J S 2016 Plasma Sources Sci. Technol. 25 065005Google Scholar
[28]
Xu H, Guo S S, Zhang H, Liu D X, Xie K 2021 Phys. Plasmas 28 123521Google Scholar
[29]
Sah A K, Al-Amin M, Talukder M R 2023 Environ. Sci. Pollut. Res. 30 74877Google Scholar
[30]
Guo H F, Xu Y F, Wang Y Y, Ren C S 2020 Phys. Plasmas 27 023519Google Scholar
[31]
Wang M Y, Han R Y, Zhang C Y, Ouyang J T 2020 IEEE International Conference on High Voltage Engineering and Application Beijing, China, September 6–10, 2020 pp1–4
[32]
Liu K, Xia H T, Yang M H, Geng W Q, Zuo J, Ostrikov K 2022 Vacuum 198 110901Google Scholar
[33]
刘坤, 左杰, 周雄峰, 冉从福, 杨明昊, 耿文强 2023 物理学报 72 055201Google Scholar
Liu K, Zuo J, Zhou X F, Ran C F, Yang M H, Geng W Q 2023 Acta Phys. Sin. 72 055201Google Scholar
[34]
Yuan H, Wang W C, Yang D Z, Zhao Z L, Zhang L, Wang S 2017 Plasma Sci. Technol. 19 125401Google Scholar
[35]
刘坤, 项红甫, 周雄峰, 夏昊天, 李华 2023 物理学报 72 115201Google Scholar
Liu K, Xiang H F, Zhou X F, Xia H T, Li H 2023 Acta Phys. Sin. 72 115201Google Scholar
[36]
Chen X, Wang X Q, Zhang B X, Yuan M, Yang S Z 2023 Chin. Phys. B 32 115201Google Scholar
[37]
Yang D Z, Zhou X F, Liang J P, Xu Q N, Wang H L, Yang K, Wang B, Wang W C 2021 J. Phys. D: Appl. Phys. 54 244002Google Scholar
[38]
Ran C F, Zhou X F, Liu K 2024 Phys. Chem. Chem. Phys. 26 18408Google Scholar
[39]
Dang V S M M, Foucher E, Rousseau A 2015 J. Phys. D: Appl. Phys. 48 424003Google Scholar
[40]
Zhou X F, Xiang H F, Yang M H, Geng W Q, Liu K 2023 J. Phys. D: Appl. Phys. 56 455202Google Scholar
[41]
Chen J Y, Zhao N, Wu J C, Wu K Y, Zhang F R, Ran J X, Jia P Y, Pang X X, Li X C 2022 Chin. Phys. B 31 065205Google Scholar
[42]
Gudmundsson J T, Thorstinsson E G 2007 Plasma Sources Sci. Technol. 16 399Google Scholar
[43]
Sakiyama Y, Graves D B, Chang H W, Shimuzu T, Morfill G E 2012 J. Phys. D: Appl. Phys. 45 425201Google Scholar
[44]
Tian W, Tachibana K, Kushner M J 2014 J. Phys. D: Appl. Phys. 47 055202Google Scholar
[45]
Jiang N, Sun Y, Peng B F, Li J, Shang K F, Lu N, Wu Y 2022 Plasma Process. Polym. 19 e2100108Google Scholar
[46]
胡杨, 罗婧怡, 蔡雨烟, 卢新培 2023 物理学报 72 130501Google Scholar
Hu Y, Luo J Y, Cai Y Y, Lu X P 2023 Acta Phys. Sin. 72 130501Google Scholar
[47]
Singh K S, Sharma A K 2021 J. Appl. Phys. 130 043302Google Scholar
[48]
Jeroen J, van de Sande M, Sola A, Gamero A, Rodero A, van der Mullen J 2003 Plasma Sources Sci. Technol. 12 464Google Scholar